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장비 상세조회

이차이온질량분석기
Secondary Ion Mass Spectrometer

분석장비 상세내역
영문약어 SIMS
장비명(한글) 이차이온질량분석기 
기기코드 PA316
연구장비표준분류
기기상태 양호 
PA316.jpg

부서 및 장비담당자

부서 및 장비담당자
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보유센터 및 부서 부산센터 분자제어소재연구팀 
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Spec 및 활용분야

Spec 및 활용분야
원리 및 특징
    초미세 이차이온 질량분석기
    · 시료 표면의 원소, 특히 light element 분석에 탁월하며 ppm level의 극미량 원소분석,동위원소 분석 등에 아주 유용· 기타참고사항: 두께 1.2cm 이하, 크기 2 cmx2cm 이하의 박막 시료
구성 및 성능
    ○Secondary Ion Mass Spectrometer

    1. Primary Ion : Cs+, O2+, O-
    2. Impact Energy
    - Cs+/- : 5-20 keV
    - O2+/- : 0.5-10 keV
    3. Mass range: 1 to 360 amu (H~U)
    4. Detection limits: ppb ~ ppm levels
    5. Options: Post-Accel/Decel, Rotation stage
활용분야
    ○ 반도체, 태양전지, LED, 철강 등 고체 시료 내 극미량 원소의 정성 및 정량 분석
    ○ 반도체 내부 극미량 원소의 doping 및 implantation 농도 분석
    ○ 다층 박막의 표면 및 계면 특성 분석 및 원소별 깊이 방향 확산 거동 분석
    ○ 철강소재의 열처리 변화에 따른 미량 원소 깊이 방향 거동 분석

장비 공지사항


연관논문

Enhanced photovoltaic performance and time varied controllable growth of a CuS nanoplatelet structured thin film and its application as an efficient counter electrode for quantum dotsensitized solar cells via a cost-effective chemical bath deposition
ChebroluVenkata Thulasi-Varma
Dalton Transactions, 2015
Influence of oxide capping layer on thermal stability of Ni germanide for nano-scale Ge MOSFETs
Ying-Ying Zhang, Jungwoo Oh, In-Shik Han, Shi-Guang Li, Soon-Yen Jung, Kee-Young Park, Hong-Sik Shin
Journal of the Korean Physical Society, 2009
Pulsed Inductively-Coupled Plasma Doping of Phosphorus for N+-P Junction Fabrication
Kee-Man Kim, Won-Jun Lee, Sang-Wook Lee, Young Jong Lee, Youn-Seoung Lee, Sa-Kyun Rha
J. Korean Phys. Soc., 2009
Interlayer Dielectric Capping Effect on Thermal Stability of Ni Germanide on Doped Ge-on-Si Substrate for Nano-scale Ge MOSFETs
Ying-Ying Zhang, Jungwoo Oh, Shi-Guang Li, Kee-Young Park, Hong-Sik Shin, In-Shik Han, Hyuk-Mim Kwon
World Congress on Engineering 2009 (WCE2009), 2009
Suppression of Nickel germanide (NiGe) Agglomeration and Ni Penetration by Hydrogen (H) Ion Shower Doping in NiGe on Thin Epitaxial Ge-on-Si Substrate
Min-Ho Kang, Ying-Ying Zhang, Kee-Young Park, Shi-Guang Li, Soon-Yen Jung, Ga-won Lee, Jin-Suk Wang,
Journal of Korean Physical Society, 2009
Physical Properties of Epitaxial Zn1–xCuxO Films Fabricated by Using Pulsed Laser Deposition
K.Ahn, F.Shan, J.M.Kim, S.Y.Jeong, C.R.Cho, J.P.Kim, J.S.Jin, H.G.Kim
JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2012
Chemical bonding states and atomic distribution within Zn(S,O) films prepared on CIGS/Mo/glass substrates by using chemical bath deposition
K.Ahn, J.H.Jeon, S.Y.Jeong, J.M.Kim, H.S.Ahn, J.P.Kim, E.D.Jeong, and C.R.Cho
CURRENT APPLIED PHYSICS, 2012
Strong ferromagnetism in Pt-coated ZnCoO: The role of interstitial hydrogen
Jong Moon Shin, Ho Sik Lee, Su Young Cha, Seunghun Lee, Ji Young Kim
APPLIED PHYSICS LETTERS, 2012
A study of the correlation between hydrogen content and magnetism in ZnCoO
S.Lee, B.S.Kim, S.W.Seo, Y.C.Cho, S.K.Kim, J.P.Kim, I.K.Jeong, C.R.Cho, C.U.Jung, H.Koinuma, and S.Y
JOURNAL OF APPLIED PHYSICS, 2012
Chemical bonding states and atomic distribution within Zn(S,O) film prepared on\r\nCIGS/Mo/glass substrates by chemical bath deposition\r\n
K. Ahn, J.H. Jeon, S.Y. Jeong, J.M. Kim, H.S. Ahn, J.P. Kim, E.D. Jeong, C.R. Cho
CURRENT APPLIED PHYSICS, 2012
Physical Properties of Epitaxial Zn1–xCuxO Films Fabricated by Using Pulsed\r\nLaser Deposition
Kyun Ahn, Fukai Shan, Jong-Man Kim, Se-Young Jeong, Chae-Ryong Cho, Jong Pil Kim, Jong-Sung Jin and
JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2012
Structural and electrical properties of rapidly annealed Ni/Mo Schottky barriers on n-type GaN
I. Jyothi, V. Rajagopal Reddy, M. Siva Pratap Reddy, Chel-Jong Choi, Jong-Seong Bae
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2010
Synthesis and characterization of lamellar-structured silica thin films with high thermal stability greater than 450 C
Jeong-Gyu Park, Ki-Rim Lee, U-Hwang Lee, Hyun-Ju Lee and Young-Uk Kwon
JOURNAL OF MATERIALS CHEMISTRY, 2011
Dielectric characterization of transparent epitaxial Ga2O3 thin film on n-GaN/Al2O3 prepared by pulsed laser deposition
이상아, 황재열, 김종필, 정세영, 조채룡
APPLIED PHYSICS LETTERS, 2006
Dielectric characterizaion of transparent epitaxial Ga2O3 thin film on n-GaN/Al2O3 prepared by pulsed laser deposition
S. A. Lee, J. Y. Hwang, J. P. Kim, S. Y. Jeong, and C. R. Cho
Appl. Phys. lett., 2006
Suppression of Nickel-germanide (NiGe) Agglomeration and Ni Penetration by Hydrogen (H) Ion Shower Doping in NiGe on a Thin Epitaxial Ge-on-Si Substrate
Min-Ho Kang
Journal of the Korean Physical Society, 2009
Low temperature deposition of transparent conducting ITO/Au/ITO films by reactive magnetron sputtering
Daeil Kim
Applied Surface Science, 2010
Physical properties of hydrogenated Al-doped ZnO thin layer treated by atmospheric plasma with oxygen gas
K. Ahn, Y.S. Jeong, H.U. Lee, S.Y. Jeong, H.S. Ahn, H.S. Kim, S.G. Yoon, C.R. Cho
Thin Solid Films, 2010
Improvement of Thermal Stability and Reduction of Schottky Barrier Height of Ni Germanide utilizing Ni-Pt(1%) alloy on Ge-on-Si Substrate
Ying-Ying Zhang, In-Sik Han, Shi-Guang Li, Soon-Yen Jung, Kee-Young Park, Hong-Sik Shin, Jung-Woo Oh
2008 Silicon Nanoelectronics Workshop (SNW 2008), 2008
Ni germanide utilizing ytterbium interlayer for high performance Ge MOSFETs
Ying-Ying Zhang, Jungwoo Oh, Shi-Guang Li, Soon-Yen Jung, Kee-Young Park, Hong-Sik Shin, Ga-Won Lee,
Electrochemical and Solid-State Letters, 2009
Thermal Immune Ni Germanide for High Performance Ge MOSFETs on Ge-on-Si Substrate Utilizing Ni0.95Pd0.05 Alloy
Ying-Ying Zhang, Jungwoo Oh, In-Sik Han, Zhun Zhong, Shi-Guang Li, Soon-Yen Jung, Kee-Young Park, Ho
IEEE Trans. Electron Devices, 2009
ITO/Au/ITO multilayer thin films for transparent conducting electrode applications
김대일
Applied Surface Science, 2007
Fabrication and characterization of Pt intermediate transparent and conducting ITO/Pt/ITO multilayer films
김대일
Journal of Physics and Chemistry of Solids, 2009
Pulsed Inductively-Coupled Plasma Doping of Phosphorus for N+_P Junction Fabrication
김기만, 이원준
Jounal of the Korean Physical Society, 2009
Direct synthesis of vanadium incorporated three-dimensional KIT-6: A systematic study in the oxidation of cyclohexane
Balasamy Rabindran Jermy, Dal-Rae Cho, Kanattukata Vijayan Bineesh, Sang-Yun Kim, Dae-Won Park
Microporous and Mesoporous Materials, 2008
Study of Implanted B+ and P+ Ions into Si(100) for Ultra Shallow Junction by SIMS
Youn-Seoung Lee, Won-Jun Lee, Myeung Hee Lee, Sa-Kyun Rha
Journal of Surface Analysis, 2008
Behavior of Bororn Implanted into n-Si(100) by Low-Energy (<2 keV) Ion Implantation for a Shallow Junction
Sa-Kyun Rha, Youn-Seoung Lee, Won-Jun Lee, Min-Seok Jeon, Jun-Kwang Song, Myeung Hee Lee
Journal of the Korean Physical Socciety, 2008
Remaining Oxide and Low-Energy Ion Implantation of BF2+ for Si(100)
W.J. Lee, 이연승(Y.S.Lee), K.S.Cheong, S. K. Rha, K. M. Kim, Won-Jun Lee
J. Korean Phys. Soc., 2007
Growth of highly conformal ruthenium-oxide thin films with enhanced nucleation by atomic layer deposition
Ji YoonPark, SeungminYeo, TaehoonCheon, TaehoonCheon, Soo HyunKim, Min KyuKim, HyungjunKim, Tae EunHong, Do JoongLee,
JOURNAL OF ALLOYS AND COMPOUNDS, 2014
Effects of AlOx incorporation into atomic layer deposited Ru thin films: Applications to Cu direct plating technology
Tae EunHong, TaehoonCheon, Soo HyunKim, Jeong KyuKim, Young BaePark, Oh JoongKwon, Myung JunKim, Jae JeongKim,
JOURNAL OF ALLOYS AND COMPOUNDS, 2013
TaCx thin films prepared by atomic layer deposition as diffusion barriers for Cu metallization
Tae EunHong, Tae HoKim, Jae HunJung, Soo HyunKim, HoonKim,
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 2014
Effects of annealing on the properties of atomic layer deposited Ru thin films deposited by NH3 and H2 as reactants
Seung JoonLee, Soo HyunKim,
THIN SOLID FILMS, 2016
Ruthenium and ruthenium dioxide thin films deposited by atomic layer deposition using a novel zero-valent metalorganic precursor, (ethylbenzene)(1,3-butadiene)Ru(0), and molecular oxygen
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MICROELECTRONIC ENGINEERING, 2015
Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
Hyun JungLee, Tae EunHong, Soo HyunKim,
JOURNAL OF ALLOYS AND COMPOUNDS, 2016
Growth of highly conformal TiCx films using atomic layer deposition technique
Tae EunHong, Sang KyungChoi, Soo HyunKim, TaehoonCheon,
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 2013
The effects of nitrogen incorporation on the properties of atomic layer deposited Ru thin films as a direct-plateable diffusion barrier for Cu interconnect
Ki YeungMun, Tae EunHong, TaehoonCheon, TaehoonCheon, YujinJang, Byoung YongLim, SunjungKim, Soo HyunKim,
THIN SOLID FILMS, 2014
A controlled growth of WNxand WCxthin films prepared by atomic layer deposition
Jun BeomKim, ByeonghyeonJang, Hyun JungLee, Won SeokHan, Do JoongLee, Han Bo RamLee, Tae EunHong, Soo HyunKim,
Materials Letters, 2016
Large enhancement of magnetic moment in nitridated CeFe12
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JOURNAL OF ALLOYS AND COMPOUNDS, 2021

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